SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20240072136A1
SERIAL NO

17896353

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A semiconductor structure includes a first transistor, a second transistor, a metal rail, and a first source/drain contact and a second source/drain contact. The first transistor has a gate structure, a first source/drain feature, and a second source/drain feature. The first source/drain feature and the second source/drain feature are on opposite sides of the gate structure. The second transistor has the gate structure, a third source/drain feature directly over the first source/drain feature, and a fourth source/drain feature directly over the second source/drain feature. The metal rail extends in an X-direction and adjacent to the gate structure in a Y-direction. The first source/drain contact and the second source/drain contact each has an L-shape in a Y-Z cross-sectional view. The first source/drain contact electrically connects the first source/drain feature to the metal rail. The second source/drain contact electrically connects the fourth source/drain feature to the metal rail.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHENG, Chun-Fu Zhubei City, TW 49 153
HUANG, Hsiang-Hung Taipei City, TW 5 3
LIN, Meng-Yu New Taipei City, TW 22 35

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