Confined Growth of 2D Materials and Their Heterostructures

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240071759A1
SERIAL NO

18238853

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Abstract

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Two-dimensional (2D) materials and their heterostructures show a promising path for next generation electronics. Nevertheless, there are challenges with (i) controlling monolayer (ML)-by-ML 2D material growth, (ii) maintaining single-domain growth, and (iii) controlling the number of layers and crystallinity at the wafer-scale. The deterministic confined growth techniques disclosed here address these challenges simultaneously to produce wafer-scale single-domain 2D MLs and their heterostructures on arbitrary substrates. The growth of the first nuclei is confined by patterning SiO2 masks on 2-inch substrates to define selective or confined growth areas. Each growth area or trench is just a few microns wide and is filled with a single-domain ML before the second set of nuclei is introduced. Growing the second set of nuclei within the trenches yields an array of single-domain bilayers at the 2-inch wafer scale. Devices made with the single-domain bilayers exhibit excellent performance over the entire wafer.

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Patent Owner(s)

Patent OwnerAddress
MASSACHUSETTS INSTITUTE OF TECHNOLOGY77 MASSACHUSETTS AVENUE CAMBRIDGE MA 02139

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bae, Sanghoon Cambridge, US 24 401
Kim, Jeehwan Cambridge, US 249 1355
Kim, Kiseok Cambridge, US 14 21

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