METHOD OF USING PROCESSING OVEN
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United States of America Patent
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Issued Date -
Feb 29, 2024
app pub date -
Nov 6, 2023
filing date -
Aug 31, 2021
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Abstract
A method of using a processing oven may include disposing at least one substrate in a chamber of the oven and activating a lamp assembly disposed above them to increase their temperature to a first temperature. A chemical vapor may be admitted into the chamber above the at least one substrate and an inert gas may be admitted into the chamber below the at least one substrate. The temperature of the at least one substrate may then be increased to a second temperature higher than the first temperature and then cooled down.
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