Importance

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Abstract

The present application relates to a device for imaging and processing a sample using a focused particle beam, comprising: (a) at least one particle source which is configured to create a particle beam in an ultrahigh vacuum environment; (b) at least one sample chamber which serves to accommodate the sample and which is configured to image the sample in a high vacuum environment and process the sample in a medium vacuum environment; (c) at least one column which is arranged in a high vacuum environment and which has at least one particle-optical component configured to shape a focused particle beam from the particle beam and direct said focused particle beam at the sample; (d) at least one detection unit which is arranged within the at least one column and which is configured to detect particles emanating from the sample; (e) at least one gas line system which terminates at the outlet of the focused particle beam from the column and which is configured to locally provide at least one process gas at the sample with a pressure such that the focused particle beam is able to induce a particle beam-induced local chemical reaction for processing the sample; and (f) at least one pressure adjustment unit through which the particle beam and the particles emanating from the sample pass and which is configured to limit a pressure increase caused at the at least one detection unit as a result of processing the sample to a factor of 10 or less, preferably to a factor of 5 or less, more preferably to a factor of 3 or less, and most preferably to a factor of 2 or less, without impeding access of the particles emanating from the sample to the at least one detection unit.

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First Claim