SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT
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United States of America Patent
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Issued Date -
Feb 15, 2024
app pub date -
Oct 27, 2023
filing date -
Jan 21, 2020
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Abstract
An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the arrays includes a filament having a varying density and power output along the length of the lamp. In particular, at least one lamp of the arrays includes a filament having a higher filament winding density within a central portion of the lamp relative to peripheral portions of the lamp. In some embodiments, the at least one lamp is a central lamp extending across a central portion of the substrate heated by the lamp. Furthermore, at least one lamp of the arrays has a higher power output within a central portion of the lamp than at peripheral portions of the lamp.
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