REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Feb 15, 2024
app pub date -
Dec 27, 2021
filing date -
Jan 8, 2021
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
This invention provides a reflective photomask blank and a reflective photomask suppressing or reducing the shadowing effect of a reflective photomask for patterning transfer using a light having a wavelength in the extreme ultraviolet region as a light source and having high interlayer adhesion between a capping layer and a low reflective part. A reflective photomask blank (10) according to this embodiment includes a substrate (1), a reflective part (5), and a low reflective part (4), in which the reflective part (5) includes a multi-layer reflective film (2) and a capping layer (3), the capping layer (3) contains Ru, the low reflective part (4) contains 40 at % or more of a material selected from Ag, Co, In, Pt, Sn, Ni, and Te, and compounds thereof, and a region at least 2 nm thick from the capping layer (3) side of the low reflective part (4) contains 25 at % or more of a material belonging to a first material group or 30 at % or more of a material belonging to a second material group, and the total film thickness of the low reflective part (4) is 45 nm or less.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully