DEPOSITION APPARATUS
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United States of America Patent
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Issued Date -
Feb 15, 2024
app pub date -
Oct 11, 2023
filing date -
Mar 18, 2014
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Abstract
A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
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