OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD
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United States of America Patent
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Issued Date -
Feb 8, 2024
app pub date -
Apr 6, 2023
filing date -
Aug 8, 2022
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Abstract
An optical proximity correction (OPC) method using a Jacobian matrix, which may minimize an edge placement error (EPE) of an arbitrary pattern, and a method of manufacturing a mask by using the OPC method. The OPC method may include obtaining training data for calculating a differentiation Jacobian matrix of a mask segment of an EPE, obtaining a neural Jacobian matrix model through artificial neural network (ANN) training using the training data, and applying a prediction value based on the neural Jacobian matrix model to mask optimization (MO) to minimize the EPE.
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