GAS MIXTURE AS CO-GAS FOR ION IMPLANT
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United States of America Patent
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Issued Date -
Feb 8, 2024
app pub date -
Jun 29, 2023
filing date -
Aug 5, 2022
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Abstract
The present disclosure relates to an ion implantation tool source and gas delivery system. The system can include a gas source comprising one or more gas supply vessels, an ion implanter arc chamber connected to the gas source, and a gallium target contained within the ion implanter arc chamber. The one or more gas supply vessels can supply a mixture of gases of hydrogen and fluoride. The hydrogen can be from 5% to 60% of the mixture of gases.
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