MEASUREMENT APPARATUS, METHOD FOR MEASURING BY INTERFEROMETRY, PROCESSING METHOD, OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM
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United States of America Patent
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Issued Date -
Feb 1, 2024
app pub date -
Jul 31, 2023
filing date -
Jul 29, 2022
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Abstract
A measurement apparatus (1) for measuring a shape of a surface (2) of a test object (3), in particular an optical surface (2) by interferometry, has:
- an illumination device (4) with an illumination source (5) for generating an illumination wave (6),an interferometer device (7) with a splitting element (8) for splitting the illumination wave into a test wave (9) directed at the surface (2) and into a reference wave (10), and for combining the returning test wave (9), having interacted with the surface to be measured, with the reference wave (10),a registration device (11) for registering and evaluating an interference pattern to determine a deviation of the measured surface shape from a target shape, anda control device (12) configured to split the surface (2) to be measured into a plurality of individual areas (13) to be measured.
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