POLYSILICON RESISTORS, METHODS FOR MANUFACTURING THE SAME, AND SUCCESSIVE APPROXIMATION REGISTER ANALOG-TO-DIGITAL CONVERTER

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United States of America Patent

APP PUB NO 20240021662A1
SERIAL NO

18473288

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Abstract

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The present disclosure provides a polysilicon resistor, a method for manufacturing the same, and a successive approximation register analog-to-digital converter. A polysilicon resistor includes a first silicon substrate; a first silicon oxide layer disposed on the first silicon substrate; a second silicon substrate disposed on the first silicon oxide layer, wherein an insulating isolation structure extends through the second silicon substrate and divides the second silicon substrate into a plurality of substrate isolation areas separated from each other; a second silicon oxide layer disposed on the second silicon substrate; and a polysilicon resistor layer disposed on the second silicon oxide layer, wherein the polysilicon resistor layer includes a plurality of polysilicon resistor blocks separated from each other, the plurality of polysilicon resistor blocks is arranged in one-to-one correspondence with the plurality of substrate isolation areas, and the plurality of polysilicon resistor blocks are connected in series.

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Patent Owner(s)

Patent OwnerAddress
CHONGQING GIGACHIP TECHNOLOGY CO LTDCHONGQING

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Guangbing Chongqing, CN 52 56
FU, Dongbing Chongqing, CN 45 23
GONG, Min Chongqing, CN 69 124
HU, Rongbin Chongqing, CN 10 10
WANG, Jianan Chongqing, CN 46 54
YANG, Zhimei Chongqing, CN 2 0
YU, Zhou Chongqing, CN 189 974
ZHANG, Zhengping Chongqing, CN 41 72
ZHU, Can Chongqing, CN 19 27

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