SELECTIVE LASER PATTERNING ON PIEZOELECTRIC THIN FILMS FOR PIEZOELECTRIC DEVICE FABRICATION
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United States of America Patent
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Issued Date -
Jan 11, 2024
app pub date -
Jul 5, 2023
filing date -
Jul 11, 2022
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Abstract
Examples disclosed herein relate to piezoelectric devices and methods of patterning piezoelectric layers for piezoelectric device fabrication. In certain embodiments, a piezoelectric layer disposed over a bottom electrode layer on a substrate is selectively etched via a laser etching process to expose portions of the bottom electrode layer. The laser etching process of the piezoelectric layer facilitates improvement of throughput and reduces hazardous byproduct production during fabrication of piezoelectric devices.
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