Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition
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United States of America Patent
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Issued Date -
Jan 11, 2024
app pub date -
Sep 24, 2023
filing date -
Sep 18, 2018
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A magnet assembly is disclosed for steering ions used in the formation of a material layer upon a substrate during a pulsed DC physical vapour deposition process. Apparatus and methods are also disclosed incorporating the assembly for controlling thickness variation in a material layer formed via pulsed DC physical vapour deposition. The magnet assembly comprises a magnetic field generating arrangement for generating a magnetic field proximate the substrate and means for rotating the ion steering magnetic field generating arrangement about an axis of rotation, relative to the substrate. The magnetic field generating arrangement comprises a plurality of magnets configured to an array which extends around the axis of rotation, wherein the array of magnets are configured to generate a varying magnetic field strength along a radial direction relative to the axis of rotation.
First Claim
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