PHOTOMASK HAVING RECESSED REGION
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United States of America Patent
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Issued Date -
Jan 11, 2024
app pub date -
Sep 22, 2023
filing date -
Aug 14, 2018
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Abstract
A photomask includes a substrate, an opaque filling formed embedded in the substrate, and an opaque main feature over the substrate. The opaque filling has a first width. The opaque main has a second width greater than the first width of the opaque filling. The opaque filling and the opaque main feature comprise same material.
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