PHOTOMASK STRUCTURE
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United States of America Patent
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Issued Date -
Jan 11, 2024
app pub date -
Jul 31, 2022
filing date -
Jul 6, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask structure including a layout pattern and at least one assist pattern is provided. The layout pattern includes corners. The assist pattern wraps at least one of the corners. There is a gap between the edge of the layout pattern and the assist pattern.
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Cited Art Landscape
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