Structured Film and Method of Using Same to Form a Pattern on a Substrate
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United States of America Patent
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Issued Date -
Jan 4, 2024
app pub date -
Dec 15, 2021
filing date -
Dec 18, 2020
priority date (Note) -
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Abstract
A structured film for forming a pattern on a substrate includes a polymeric support layer, an adhesive layer, an etch resist layer disposed between the polymeric support layer and the adhesive layer, a structured resin layer disposed between the polymeric support layer and the etch resist layer, and one or more unstructured layers disposed between the etch resist layer and the adhesive layer. The structured resin layer has a structured major surface including a plurality of engineered structures. The etch resist layer at least partially fills spaces between adjacent engineered structures to substantially planarize the structured major surface. Methods of using the structured film to form a pattern on a substrate are described.
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