PARTICLE REMOVING ASSEMBLY AND METHOD OF SERVICING ASSEMBLY

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240001414A1
SERIAL NO

18224520

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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An apparatus includes a wafer stage and a particle removing assembly. The wafer stage includes a cup adjacent to a wafer chuck. The particle removing assembly is configured to remove contaminant particles from the cup. In some embodiments, the particle removing assembly comprises a flexible ejecting member that includes one or more elongated tubes, a front tip, and a cleaning tip adapter configured to attach the front tip to each of the one or more elongated tubes. The front tip includes front openings and lateral openings from which pressurized cleaning material are introduced onto an unreachable area of the cup to remove the contaminant particles from the cup.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN ROD 6 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU 300-77

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Wei-Yi Hsinchu, TW 2 0
Huang, Jao Hsinchu, TW 2 0
Kuo, Faung Yu Hsinchu, TW 1 0
Liu, Kai Yu Hsinchu, TW 4 0
WU, Meng-Hsueh Hsinchu, TW 4 8
Wu, Yu-Chun Hsinchu, TW 25 43

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