COATING DEVICE
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United States of America Patent
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Issued Date -
Jan 4, 2024
app pub date -
Aug 20, 2021
filing date -
Sep 7, 2020
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Abstract
In a coating device wherein a relative movement between an application nozzle located above a coated object W and the coated object is effected to apply a coating liquid P in a coating liquid reservoir of the application nozzle onto a surface of the coated object via a slit-shaped discharge port, the coating device includes: a shutter member rotatable in the coating liquid reservoir to open or close space between the coating liquid reservoir and the slit-shaped discharge port; and a gas feed regulation means for regulating the pressure on the coating liquid in the coating liquid reservoir, and is characterized in that in a state where the gas feed regulation means maintains the pressure on the coating liquid in the coating liquid reservoir to be at a given level, the shutter member is rotated to open or close space between the coating liquid reservoir and the slit-shaped discharge port.
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