BUFFER CHAMBER, SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
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United States of America Patent
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Dec 28, 2023
app pub date -
Jan 16, 2023
filing date -
Jan 16, 2023
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The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a batch-type treating bath for treating a substrate in a batch-type manner; a single-type treating chamber for treating the substrate in a single-type manner; and a buffer chamber positioned on a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and supplying a liquid for maintaining a wetting state of the substrate.
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