Simultaneous multi-bandwidth optical inspection of semiconductor devices

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United States of America Patent

PATENT NO 12068207
APP PUB NO 20230411223A1
SERIAL NO

17826318

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Abstract

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A method of qualifying semiconductor wafer processing includes: illuminating a semiconductor wafer simultaneously with source light having wavelengths in a plurality of wavebands, including at least a first waveband and a second waveband, the second waveband being different from the first waveband; separating light reflected from the semiconductor wafer as a result of said illuminating, the separating dividing the reflected light according to waveband; generating a first image of the semiconductor wafer based on reflected light separated into the first waveband; and, generating a second image of the semiconductor wafer base on reflected light separated into the second waveband.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chien-Huei Kaohsiung, TW 15 104
Chen, Xiaomeng Hsinchu, TW 121 2120
Chung, Hung-Yi Taoyuan, TW 11 39
Huang, Hsiu-Hui Hsinchu, TW 4 0
Wang, Shih-Chang Tainan, TW 37 137

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