SYSTEM AND PROJECTION EXPOSURE APPARATUS
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United States of America Patent
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Issued Date -
Dec 21, 2023
app pub date -
Aug 4, 2023
filing date -
Feb 9, 2021
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Abstract
A system for a projection exposure apparatus which comprises a first component, a second component, and a decoupling device configured to decouple the second component in more than one degree of freedom from mechanical excitations of the first component. The decoupling device comprises first decoupling elements which have a positive stiffness. The decoupling device also comprises second decoupling elements, which have a negative stiffness. The decoupling device further comprises a third component, which is arranged between the first and second components.
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