GAS TRANSPORT SYSTEM

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United States of America Patent

APP PUB NO 20230407893A1
SERIAL NO

18365776

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Abstract

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A conduit system for transporting gas from a gas containing chamber for processing a substrate from which semiconductor devices are formed includes a liner with a spiral vent. The conduit system utilizes a curtain of gas to prevent or reduce deposition of material onto an inner surface of the conduit transporting the gas from the gas containing chamber.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HUANG, Mao-Chou Hsinchu, TW 3 0
LI, Jheng-Syun Hsinchu, TW 4 12

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