Gas Control System and Method with Bracketed Deadband
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United States of America Patent
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Issued Date -
Dec 7, 2023
app pub date -
Jun 2, 2022
filing date -
Jun 2, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A control system having a primary run and a trim run, each run including an inlet coupled to a main gas supply line, a pneumatically actuated control valve positioned downstream of the inlet, a pneumatic pressure controller having variable deadband adjustment, and an outlet feeding into a gas supply line to the facility. The control valve of the primary run is preferably high-capacity, while the control valve of the trim run is low-capacity. Further, the system and method for controlling gas supply to the facility has a total flow capacity through the primary run and trim run to the facility being defined by CX, which is the total flow capacity of the primary run (CP) plus the total flow capacity of the trim run (CT), and an actual gas flow to the facility being defined by FX, which is the actual flow of the primary run (FP) plus the actual flow of the trim run (FT) and wherein FX is less than CX, CT is less than CP and FX is either stable, increasing, or decreasing based on a demand from the facility.
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