GALLIUM NITRIDE CRYSTAL, GALLIUM NITRIDE SUBSTRATE, AND METHOD FOR PRODUCING GALLIUM NITRIDE SUBSTRATE

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United States of America Patent

APP PUB NO 20230392280A1
SERIAL NO

18237496

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Abstract

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An object of the present invention is to provide a GaN crystal long in light emission lifetime by time-resolved photoluminescence measurement and provide high-quality GaN crystal and GaN substrate that have few specified crystal defects affecting the light emission lifetime. A gallium nitride crystal having a light emission lifetime by time-resolved photoluminescence measurement, of 5 ps or more and 200 ps or less, and satisfying at least one of the following requirement (i) and requirement (ii): (i) an FWHM in a 004 diffraction X-ray rocking curve is 50 arcsec or less at least one position of the crystal; and (ii) a dislocation density is 5×106 cm−2 or less.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BAO, Quanxi Tokyo, JP 5 5
CHICHIBU, Shigefusa Sendai-shi, JP 9 44
IKEDA, Hirotaka Tokyo, JP 17 55
ISHIGURO, Toru Sendai-shi, JP 6 32
KOJIMA, Kazunobu Sendai-shi, JP 16 240
KURIMOTO, Kouhei Tokyo, JP 8 37
MIKAWA, Yutaka Tokyo, JP 36 168
SHIMA, Kohei Sendai-shi, JP 7 353

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