METHOD FOR PRODUCING REACTION GAS CONTAINING 1,1,2-TRIFLUOROETHANE (R-143) AND/OR (E,Z)-1,2-DIFLUOROETHYLENE (R-1132(E,Z))

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United States of America Patent

APP PUB NO 20230391696A1
SERIAL NO

18209652

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Abstract

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The present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)) using a starting material that is easier to obtain than those used in conventional methods. Specifically, the present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)), the method comprising subjecting a starting material gas containing difluoromethane (R-32) to a reaction that involves thermal decomposition at a pressure of 0.6 MPaG or more and 2.0 MPaG or less and a temperature of 600° C. or more and 1000° C. or less, thereby obtaining the reaction gas.

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Patent Owner(s)

Patent OwnerAddress
DAIKIN INDUSTRIES LTDOSAKA-SHI OSAKA 530-0001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HASUMOTO, Yuuta Osaka, JP 4 1
NOGUCHI, Atsushi Osaka, JP 53 447
OTSUKA, Tomo Osaka, JP 2 0
TAKAKUWA, Tatsuya Osaka, JP 79 425

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