Importance

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Abstract

According to one embodiment, a manufacturing method of a display device includes forming a sealing layer. The forming the sealing layer includes a deposition process of introducing a material gas into a chamber, depositing silicon nitride on a processing substrate, stopping introduction of the material gas and evacuating a residual gas of inside of the chamber, and an etching process of introducing a cleaning gas into the chamber through a same route as the material gas, performing anisotropic dry etching for removing part of the silicon nitride deposited on the processing substrate, and evacuating a residual gas of the inside of the chamber. A combination of the deposition process and the etching process is performed at least twice.

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First Claim