SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS

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United States of America Patent

APP PUB NO 20230384680A1
SERIAL NO

18365529

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Abstract

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A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSIN-CHU 300-77

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Yu-Chen Toufen Township, TW 53 256
Hwang, Ho-Yung David Chu Pei City, TW 46 361
Lee, Heng-Jen Baoshan Township, TW 34 632
Liu, Hsu-Yuan Zhudong Township, TW 4 6
Wang, Shih-Che Hsin-Chu City, TW 24 108
Wu, Cheng-Han Taichung City, TW 111 309
Zhou, Wen-Zhan Zhubei City, TW 16 365

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