METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Nov 23, 2023
app pub date -
Aug 13, 2021
filing date -
Jan 4, 2021
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A method and a device for correcting a placement error of a photomask are provided. The method includes: acquiring an exposure offset during a wafer exposure after photomask manufacture is completed, wherein the wafer exposure is a process of forming a circuit pattern on a wafer surface by exposure; and determining a compensation offset for subsequent photomask manufacture according to the exposure offset, to correct a placement error of a photomask, wherein the compensation offset and the exposure offset are vector values that are equal in value and opposite in direction. The method and device for correcting the placement error of the photomask provided in the embodiments of the present disclosure can reduce an overlay error existing in a photolithography process of a semiconductor device by correcting a placement error of a photomask.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully