POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICEOUS FILM USING THE SAME

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United States of America Patent

APP PUB NO 20230374226A1
SERIAL NO

18029388

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Abstract

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A polysilazane having a ratio of the amount of SiH3 exceeding 0.050 and a ratio of the amount of NH of less than 0.045, based on the amount of aromatic ring hydrogen of xylene when 1H-NMR of a 17% by mass solution of polysilazane dissolved in xylene is measured. A siliceous film-forming composition comprising the polysilazane. A method for producing a siliceous film comprising applying the polysilazane composition above a substrate.

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Patent Owner(s)

Patent OwnerAddress
MERCK ELECTRONICS LTDARCO TOWER 5F 1-8-1 SHIMOMEGURO MEGURO-KU TOKYO 153-8605

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
OKAMURA, Toshiya Kakegawa-shi, JP 9 9
OKAYASU, Tetsuo Kakegawa-shi, JP 12 41
SUZUKI, Katsuchika Kakegawa-shi, JP 4 14
VOM, STEIN Thorsten Darmstadt, DE 7 6

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