BLANK MASK AND PHOTOMASK USING THE SAME
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United States of America Patent
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Issued Date -
Nov 16, 2023
app pub date -
May 5, 2023
filing date -
May 5, 2023
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Abstract
A blank mask includes a light-transmitting substrate; and a light-shielding film on the light-transmitting substrate. The light-shielding film includes a transition metal and oxygen, and a scum formation time required to generate scum is 120 minutes or more when light with a wavelength of 172 nm and an intensity of 10 kJ/cm2 is applied on the light-shielding film.
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