HAT CAPABLE OF RECOVERING ORIGINAL SHAPE AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20230366146A1
SERIAL NO

17742766

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Abstract

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A hat capable of recovering the original shape and a method of manufacturing the same are provided. The hat is characterized by preparing mixtures comprising waterborne polyurethane, water, and crosslinking agent; coating synthetic fiber yarns of the hat with the mixture; curing the mixtures in a certain temperature condition in order to form a thin polyurethane film on the surface of fabric or knitted fabric for the hat. The curing reaction products by the waterborne polyurethane component implement a shape recovery of the hat after the deformation or damage due to the external force in the initial shape of the hat.

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Patent Owner(s)

Patent OwnerAddress
CHANG YOUNG HWAN1005 DONG 904 HO 430 TANJUNG-RO ILSANDONG-KU KOYANG-SI KYUNGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Young Hwan Kyunggi-do, KR 7 35

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