METHOD FOR PREPARING FINE PARTICLES HAVING ENCLOSED VOIDS WITH IMPROVED STAIN RESISTANCE CONTAINING FUNCTIONAL PHOSPHORIC ACID MONOMER AND COMPOSITION COMPRISING THE PARTICLES
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United States of America Patent
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Issued Date -
Nov 16, 2023
app pub date -
May 9, 2023
filing date -
May 9, 2023
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Abstract
An object of the present disclosure is to provide a method for preparing fine particles having enclosed voids with improved stain resistance and composition comprising the particles by preventing free radicals from interfering with core swelling due to the cross-linking monomer upon polymerization of a secondary hard-shell and by removing the residual initiator by additional polymerization of the phosphoric acid monomer and the hard-shell monomer.
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