METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM
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United States of America Patent
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Issued Date -
Nov 9, 2023
app pub date -
Aug 24, 2021
filing date -
Sep 28, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.
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