DIGIT LINE AND CELL CONTACT ISOLATION

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20230354585A1
SERIAL NO

17731895

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods, apparatuses, and systems related to a digit line and cell contact are described. An example apparatus includes a semiconductor structure comprising a first layer comprising a first material on sidewalls of a plurality of patterned material. The apparatus further includes a second layer comprising a nitride material on sidewalls of the first layer. The apparatus further includes a third layer comprising the first material on sidewalls of the second layer. The apparatus further includes a base area, to provide digit line and cell contact isolation for the semiconductor structure. The apparatus further includes an active area, adjacent to the base area, that is adjacent to the semiconductor structure.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INC8000 SOUTH FEDERAL WAY BOISE ID 83716

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Albert P Boise, US 5 1
Lin, Yen Ting Boise, US 5 28
Sapra, Sanjeev Boise, US 36 189
Shreeram, Devesh Dadhich Meridian, US 12 3
Yadav, Vivek Boise, US 24 49

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