METHOD FOR PRODUCING WETTING AGENT FOR SEMICONDUCTOR, CONTAINING POLYVINYL ALCOHOL COMPOSITION, POLISHING COMPOSITION CONTAINING WETTING AGENT FOR SEMICONDUCTOR, OBTAINED BY THE PRODUCTION METHOD, AND METHOD FOR PRODUCING POLISHING COMPOSITION

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United States of America Patent

APP PUB NO 20230331930A1
SERIAL NO

18028920

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Abstract

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To provide a polyvinyl alcohol composition effectively suppressed in generation of an aggregated product, in a method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCORPORATEDAICHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AKIZUKI, Reiko Kiyosu-shi, Aichi, JP 2 3
ANDO, Ryunosuke Kiyosu-shi, Aichi, JP 1 2
TANSHO, Hisanori Kiyosu-shi, Aichi, JP 14 45
TSUCHIYA, Kohsuke Kiyosu-shi, Aichi, JP 35 93
YAMAGUCHI, Hiroki Kiyosu-shi, Aichi, JP 140 609

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