RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN
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United States of America Patent
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Issued Date -
Oct 12, 2023
app pub date -
Jun 9, 2023
filing date -
Dec 1, 2015
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Abstract
A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
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