Methods and systems for aligning a multi-beam system

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United States of America Patent

PATENT NO 12057287
APP PUB NO 20230317405A1
SERIAL NO

17709025

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Abstract

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The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.

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FEI COMPANY5350 NE DAWSON CREEK DRIVE HILLSBORO OR 97124

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sed'A, Bohuslav Brno, CZ 13 42
Stopka, Jan Brno, CZ 5 0
Va{hacek, over (s)}ina Radovan Brno, CZ 1 0
{hacek, over (S)}ejnoha Radim Brno, CZ 1 0

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