Surface Analysis Device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20230296644A1
SERIAL NO

18018613

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention pertains to a surface analysis device (1) and provides a technology that can increase accuracy and quality of measurement and analysis even when a local deviation is generated in height information of a measurement result of a scanning probe microscope (SPM) (2), due to an atmospheric pressure change with respect to an airtight tank (10). The surface analysis device (1) is provided with: an airtight tank (10); a stage (6) that holds a sample (5) in the airtight tank (10); the SPM (2) that is fixed to a structure configuring the airtight tank (1) and that measures the surface of the sample (5); a sensor (4) that is disposed outside of the airtight tank (10) and that measures atmospheric pressure; and a computer system that analyzes the surface of the sample by using a first signal obtained through measurement by the SPM (2) and a second signal obtained through measurement by the sensor (4).

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH TECH CORPJAPAN TOKYO PORT XIXINQIAO 1 CHOME 24 NO 14

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ANDO, Yasuhiro Tokyo, JP 32 821
FUKAYA, Ritsuo Tokyo, JP 22 260
ISOZAKI, Yoshihiro Tokyo, JP 1 0

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