PROCESS AND PLANT FOR REMOVING CARBON DIOXIDE AND WATER FROM SYNTHESIS GAS
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United States of America Patent
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Issued Date -
Sep 21, 2023
app pub date -
Mar 17, 2023
filing date -
Mar 18, 2022
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present invention relates to a gas scrubbing process and a plant for removing carbon dioxide (CO2) and water (H2O) from synthesis gas, wherein the synthesis gas includes at least hydrogen (H2), carbon dioxide (CO2) and water (H2O), The invention features a dedicated circuit for water removal which comprises a scrubbing apparatus for removal of water by means of the physical absorption medium used in the gas scrubbing process. The absorption medium supplied to the scrubbing apparatus is withdrawn from a thermal separation apparatus for separation of water and absorption medium. The circuit is arranged such that water entrained via synthesis gas to be purified cannot pass into the main absorption medium circuit which is formed inter alia by an absorption apparatus and a regeneration apparatus. The energy cost and the apparatus complexity especially in respect of the thermal separation apparatus is thus reduced.
First Claim
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