PROCESS CHAMBER WITH UV IRRADIANCE
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United States of America Patent
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Issued Date -
Sep 21, 2023
app pub date -
May 3, 2023
filing date -
Aug 31, 2021
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Abstract
A semiconductor processing apparatus includes a process chamber that defines an enclosure. The enclosure includes a substrate support configured to support a substrate and rotate the substrate about a central axis of the process chamber. The substrate support is also configured to move vertically along the central axis and position the substrate at multiple locations in the enclosure. The apparatus also includes one or more UV lamps configured to irradiate a top surface of the substrate supported on the substrate support.
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