GAS CLEANING METHOD, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20230294145A1
SERIAL NO

18162756

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A gas cleaning method includes: (a) removing a first metal element as one of contaminants from a process chamber by supplying a chlorine-containing gas into the process chamber without supplying an oxygen-containing gas; and (b) removing a second metal element as another one of the contaminants from the process chamber by supplying the oxygen-containing gas into the process chamber, wherein (b) is performed after (a).

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CORPORATIONTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HARADA, Toru Toyama-shi, JP 109 1719
HORII, Sadayoshi Toyama-shi, JP 41 2570
KOBAYASHI, Takahiro Toyama-shi, JP 227 1973
NAKAMURA, Iwao Toyama-shi, JP 23 1205
NOMURA, Hisashi Toyama-shi, JP 8 525

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation