ELECTROSTATIC CHUCK DEVICE, PRESSURE CALCULATION METHOD AND PROGRAM
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United States of America Patent
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Issued Date -
Aug 31, 2023
app pub date -
Jun 22, 2021
filing date -
Aug 5, 2020
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Abstract
An electrostatic chuck device for adsorbing an object by electrostatic force comprises an adsorption plate that has an adsorption surface to adsorb the object, a gas supplying line that supplies a thermally conductive gas to a gap between the adsorption surface and an adsorbed surface of the object and a pressure calculation section that calculates the pressure of the thermally conductive gas in the gap. The gas supplying line is provided with a flow rate resistive element that serves as a resistance when the thermally conductive gas flows. The pressure calculation section calculates the pressure of the thermally conductive gas in the gap based on the primary side pressure of the flow rate resistive element, the flow rate of the thermally conductive gas passing through the flow rate resistive element and the flow characteristic of the flow rate resistive element.
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