ATOMIC-SMOOTH DEVICE WITH MICROSTRUCTURE, AND METHOD FOR PREPARING SAME

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United States of America Patent

APP PUB NO 20230271825A1
SERIAL NO

17923648

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Abstract

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Provided is an atomic-smooth device with a microstructure. The device includes, from the bottom to top, a substrate, a bonding material, a second dielectric layer on the substrate, the microstructure, and a first dielectric layer, where a surface of the first dielectric layer is an atomic-smooth surface. Further provided is a method for preparing an atomic-smooth device with a microstructure to effectively avoid pits or burrs generated when the existing microstructure is machined.

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Patent Owner(s)

Patent OwnerAddress
TSINGHUA UNIVERSITY100084 TSINGHUA YUAN BEIJING HAIDIAN DISTRICT BEIJING CITY BEIJING CITY 100084
RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHENSHENZHEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
XIANG, Xiaojian Beijing, CN 2 0
ZHENG, Quanshui Beijing, CN 4 2

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