Apparatus and Method for Exposure or Relief Precursors

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20230264466A1
SERIAL NO

18009922

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.

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Patent Owner(s)

Patent OwnerAddress
XSYS PREPRESS NVOOSTKAAI 50 IEPER 8900

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
WATTYN, Bart Marc Luc Dentergem, BE 15 5

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