Charged Particle Beam Device and Scan Waveform Generation Method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20230260739A1
SERIAL NO

18012478

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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It is aimed to properly correct the various types of distortion without a reduction in observation throughput. The present disclosure provides a charged particle beam device that obtains an image by irradiating a specimen with a charged particle beam and includes: a deflection coil that scans the charged particle beam on the specimen; a D/A converter that converts a digital scan waveform into an analog scan waveform and outputs the analog scan waveform to the deflection coil to drive the deflection coil; and a scan waveform generation unit that generates a digital scan waveform and outputs the digital scan waveform to the D/A converter, in which the scan waveform generation unit has a basic LUT that stores parameters for correcting the digital scan waveform and includes a correction circuit that corrects a distortion characteristic of the deflection coil

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 1056409 ?1056409

International Classification(s)

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  • 2020 Application Filing Year
  • H01J Class
  • 2540 Applications Filed
  • 1680 Patents Issued To-Date
  • 66.15 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ITABASHI, Hironori Tokyo, JP 4 5
KAMIO, Masato Tokyo, JP 5 8
KANNAMI, Hiroki Tokyo, JP 2 0
NAKAMURA, Mitsuhiro Tokyo, JP 172 2519
SEKI, Yusuke Tokyo, JP 34 138
TANUMA, Keisuke Tokyo, JP 2 0
UEZONO, Takumi Tokyo, JP 22 12

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  • H01J Class
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3687790501 - 1011 - 2001000200030004000250500750125015001750225025002750325035003750

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