Mask and method of forming the same

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United States of America Patent

PATENT NO 12066757
APP PUB NO 20230259014A1
SERIAL NO

18308635

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Abstract

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A mask includes a reflective layer, an absorption layer and an absorption part. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective layer and the absorption layer, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun-Lang Tainan, TW 55 312
Chen, Jheng-Yuan Hsinchu, TW 5 5
Tu, Chih-Chiang Tauyen, TW 85 480
Yang, Shih-Hao Tainan, TW 14 20

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