SEMICONDUCTOR DEVICE

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United States of America Patent

APP PUB NO 20230253264A1
SERIAL NO

18300983

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Abstract

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A semiconductor device is provided. The semiconductor device includes a substrate including an active pattern, a gate electrode extending in a first direction and crossing the active pattern which extends in a second direction, a separation structure crossing the active pattern and extending in the first direction, a first gate dielectric pattern disposed on a side surface of the gate electrode, a second gate dielectric pattern disposed on a side surface of the separation structure, and a gate capping pattern covering a top surface of the gate electrode. A level of a top surface of the separation structure is higher than a level of a top surface of the gate capping pattern.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD416 MAETAN-DONG YEONGTONG-GU SUWON-CITY GYEONGGI-DO 442-742

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HWANG, EUICHUL Seoul, KR 6 73
JUNG, JOOHO Suwon-si, KR 6 4
KIM, JUYOUN Suwon-si, KR 30 94
LEE, SUNGMOON Suwon-si, KR 12 11
NA, HYUNGJOO Seoul, KR 7 3
SUH, BONGSEOK Seoul, KR 14 30
YOO, SANGMIN Suwon-si, KR 23 22

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