Method for an ion implantation process employing an ion-collecting device that collects a distribution of ejected ions from a target to correct a tilt angle of the target

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United States of America Patent

PATENT NO 12051593
APP PUB NO 20230230839A1
SERIAL NO

18126861

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Abstract

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The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Tsung Wei New Taipei, TW 7 37
Chu, Li-Hsin New Taipei, TW 30 38
Hsu, Kuang Huan Hsinchu, TW 12 5
Hsu, Yung-Lin Hsinchu, TW 23 73
Huang, Chun-Jung Tuku Township, TW 28 41
Peng, Henry Hsinchu, TW 9 18
Tsai, Po-Feng Taipei, TW 23 187

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