SYSTEMS AND METHODS FOR PREDICTING LAYER DEFORMATION
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United States of America Patent
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Jul 13, 2023
app pub date -
Mar 7, 2023
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Dec 4, 2017
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Abstract
A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.
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