IMPRINT LITHOGRAPHY
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United States of America Patent
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Issued Date -
Jul 13, 2023
app pub date -
Mar 21, 2023
filing date -
Aug 5, 2010
priority date (Note) -
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Abstract
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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